Electronic Grade Carbon Tetrafluoride CF4 99.999% is the most widely used plasma etching gas in the microelectronics industry. It is widely used in etching thin film materials such as silicon, silicon dioxide, silicon nitride, phosphorus silicon glass and tungsten. It is also widely used in electronic device surface cleaning, solar cell production, laser technology, low temperature refrigeration, gas insulation, leakage detection agent, control of space rocket attitude, detergent, lubricant and brake fluid in printed circuit production. Due to its strong chemical stability, Electronic Grade Carbon Tetrafluoride CF4 99.999% can also be used in metal smelting and plastic Industri . Karakteristik dan tren pengembangan gas elektronik yang digunakan dalam sirkuit terintegrasi skala ultra-besar saat ini adalah ultra-murni,} {{12} {{12} yang lebih banyak untuk mempromosikan pengembangan industri mikroelectronic {12} {12} lebih banyak untuk mempromosikan mikro, negara-negara {12} untuk mempromosikan mikroelectronics {12} {12} {12} lebih banyak. Saat ini, karbon tetrafluoride (CF4) telah lama menduduki pasar gas etsa dengan harga yang relatif rendah, sehingga memiliki potensi pengembangan yang luas .
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